Extreme Ultraviolet (EUV) Lithography Market Introduction and Overview
According to SPER Market Research, the Global Extreme Ultraviolet (EUV) Lithography Market is estimated to reach USD 121.07 billion by 2033 with a CAGR of 25.31%.
The report includes an in-depth analysis of the Global Extreme Ultraviolet (EUV) Lithography Market, including market size and trends, product mix, applications, and supplier analysis. There are some significant variations between typical photomasks and the EUV mask. It is made up of a thin silicon substrate covered in a reflective multilayer coating. While absorbing other wavelengths, the reflective coating is intended to reflect EUV light. The mask pattern is etched onto the reflective coating, and the pattern is projected onto the silicon wafer when exposed to EUV light. Furthermore, the powerful EUV light used in the lithography process needs to be shaped, focused, and directed, and here is where EUV optics come into play.
- March 2022; The FPA-1200NZ2C Extreme Ultraviolet Lithography (EUV) system was introduced by Canon Inc. The most cutting edge chipmaking technology now in use can be produced by this new method at a 5-nanometer (nm) process. The creation of the most potent and effective semiconductors, which are used in a range of gadgets including laptops and cellphones, depends on EUV lithography.
- December 2022; A specially designed optical system for EUV lithography was created by Carl Zeiss AG. It operates in a vacuum and uses mirrors only. This complete system is around 1.5 meters tall, has a weight of about 3.5 tons, and has more than 35000 individual parts.
Market Opportunities and Challenges
Opportunities: The market for EUV (extreme ultraviolet) lithography is expected to grow significantly as a result of the growing use of this technology in memory production. Electronic gadgets like computers, smartphones, and data centers depend heavily on memory devices like DRAM (Dynamic Random Access Memory) and NAND Flash. Higher capacity, faster, and more energy-efficient memory solutions are in greater demand as memory technology develops. EUV lithography is a desirable alternative for producing cutting-edge memory devices because of its distinct benefits. More precisely patterned and high-resolution imaging can be achieved with EUV lithography, leading to the production of denser and smaller memory cells. This is especially significant when considering advanced memory designs and next-generation memory technologies like 3D NAND Flash and EUV-based DRAM.
Challenges: Significant obstacles in the EUV (Extreme Ultraviolet) lithography market include source power and productivity. The intensity of the EUV light produced by the light source utilized in the lithography system is referred to as the source power. Productivity is the system's total throughput and wafer processing capacity, whereas it directly affects the lithography process's speed and efficiency. To satisfy the needs of high-volume semiconductor manufacturing, faster exposure times and better wafer throughput are critical, and these can only be achieved with high-source power availability. Increased source power enables more effective exposure, which shortens the exposure time for each wafer and increases the quantity of wafers processed in a given amount of time.
Market Competitive Landscape
The Extreme Ultraviolet (EUV) Lithography Market is a highly competitive arena due to the presence of multiple global and regional companies in the competitive environment. Leading companies in the industry are ASML, Canon Inc., Global Foundries, Intel Corporation, Nikon Corporation, NTT Advanced Technology Corporation, Nuflare Technology Inc., SAMSUNG, SUSS Microtec SE, Taiwan Semiconductor Manufacturing Company Limited, Toshiba India Pvt. Ltd., Others.
Scope of the Report:
| Report Metric | Details |
| Market size available for years | 2020-2033 |
| Base year considered | 2023 |
| Forecast period | 2024-2033 |
| Segments covered | By Type, By Equipment, By Application, By End-User
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| Regions covered | North America, Asia-Pacific, Latin America, Middle East & Africa and Europe
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| Companies Covered | ASML, Canon Inc., Global Foundries, Intel Corporation, Nikon Corporation, NTT Advanced Technology Corporation, Nuflare Technology Inc., SAMSUNG, SUSS Microtec SE, Taiwan Semiconductor Manufacturing Company Limited, Toshiba India Pvt. Ltd., others.
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COVID-19 Impact on Global Extreme Ultraviolet (EUV) Lithography Market
COVID-19 caused long-lasting effects on a variety of industries, including economic disruptions, a pause across all global operations, and the forced stay at home of the great majority of workers. To satisfy consumers, numerous businesses had to adjust to the shifting political and policy environments around the world. Global manufacturing activity decreased as a result of factory closures and a shortage of raw materials. Industrial automation technologies are widely used by organizations because they lower labor costs and boost production. The EUC lithography market has experienced rapid recovery due to the resumption of economic activity worldwide and the growing demand for advanced technology.
Key Target Audience:
- Semiconductor Manufacturers
- Consumer Electronics Companies
- Automotive Industry
- Telecommunications Firms
- Data Centers and Cloud Service Providers
- Aerospace and Defense
Our in-depth analysis of the Extreme Ultraviolet (EUV) Lithography Market includes the following segments:
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By Type: |
Light Source
Exposure Device
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By Equipment: |
Mask
Mirrors
Others
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By Application: |
Laser Produced Plasmas (LPP)
Vacuum Sparks
Gas Discharge
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By End-Users: |
Integrated Device Manufacturers (IDM)
Foundry
Memory
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Key Topics Covered in the Report:
- Global Extreme Ultraviolet (EUV) Lithography Market Size (FY’2024-FY’2033)
- Overview of Global Extreme Ultraviolet (EUV) Lithography Market
- Segmentation of Global Extreme Ultraviolet (EUV) Lithography Market by Type (Light Source, Exposure Device)
- Segmentation of Global Extreme Ultraviolet (EUV) Lithography Market by Equipment (Mask, Mirrors, Others)
- Segmentation of Global Extreme Ultraviolet (EUV) Lithography Market by Application (Laser Produced Plasma (LPP), Vacuum Sparks, Gas Discharge)
- Segmentation of Global Extreme Ultraviolet (EUV) Lithography Market by End-User (Integrated Device Manufacturers (IDM), Foundry, Memory)
- Statistical Snap of Global Extreme Ultraviolet (EUV) Lithography Market
- Expansion Analysis of Global Extreme Ultraviolet (EUV) Lithography Market
- Problems and Obstacles in Global Extreme Ultraviolet (EUV) Lithography Market
- Competitive Landscape in the Global Extreme Ultraviolet (EUV) Lithography Market
- Impact of COVID-19 and Demonetization on Global Extreme Ultraviolet (EUV) Lithography Market
- Details on Current Investment in Global Extreme Ultraviolet (EUV) Lithography Market
- Competitive Analysis of Global Extreme Ultraviolet (EUV) Lithography Market
- Prominent Players in the Global Extreme Ultraviolet (EUV) Lithography Market
- SWOT Analysis of Global Extreme Ultraviolet (EUV) Lithography Market
- Global Extreme Ultraviolet (EUV) Lithography Market Future Outlook and Projections (FY’2024-FY’2033)
- Recommendations from Analyst
1. Introduction
1.1. Scope of the report
1.2. Market segment analysis
2. Research Methodology
2.1. Research data source
2.1.1. Secondary Data
2.1.2. Primary Data
2.1.3. SPER’s internal database
2.1.4. Premium insight from KOL’s
2.2. Market size estimation
2.2.1. Top-down and Bottom-up approach
2.3. Data triangulation
3. Executive Summary
4. Market Dynamics
4.1. Driver, Restraint, Opportunity and Challenges analysis
4.1.1. Drivers
4.1.2. Restraints
4.1.3. Opportunities
4.1.4. Challenges
4.2. COVID-19 Impacts of the Global Extreme Ultraviolet (EUV) Lithography Market.
5. Market variable and outlook
5.1. SWOT Analysis
5.1.1. Strengths
5.1.2. Weaknesses
5.1.3. Opportunities
5.1.4. Threats
5.2. PESTEL Analysis
5.2.1. Political Landscape
5.2.2. Economic Landscape
5.2.3. Social Landscape
5.2.4. Technological Landscape
5.2.5. Environmental Landscape
5.2.6. Legal Landscape
5.3. PORTER’s Five Forces
5.3.1. Bargaining power of suppliers
5.3.2. Bargaining power of buyers
5.3.3. Threat of Substitute
5.3.4. Threat of new entrant
5.3.5. Competitive rivalry
5.4. Heat Map Analysis
6. Competitive Landscape
6.1. Global Extreme Ultraviolet (EUV) Lithography Market Manufacturing Base Distribution, Sales Area, Product Type
6.2. Mergers & Acquisitions, Partnerships, Product Launch, and Collaboration in Global Extreme Ultraviolet (EUV) Lithography Market
7. Global Extreme Ultraviolet (EUV) Lithography Market, By Type (USD Million) 2020-2033
7.1. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By Type, 2020-2026
7.2. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By Type, 2027-2033
7.3. Light Source
7.4. Exposure Device
8. Global Extreme Ultraviolet (EUV) Lithography Market, By Equipment (USD Million) 2020-2033
8.1. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By Equipment, 2020-2026
8.2. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By Equipment, 2027-2033
8.3. Mask
8.4. Mirrors
8.5. Others
9. Global Extreme Ultraviolet (EUV) Lithography Market, By Application (USD Million) 2020-2033
9.1. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By Application, 2020-2026
9.2. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By Application, 2027-2033
9.3. Laser Produced Plasmas (LPP)
9.4. Vacuum Sparks
9.5. Gas Discharge
10. Global Extreme Ultraviolet (EUV) Lithography Market, By End-Users (USD Million) 2020-2033
10.1. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By End-Users, 2020-2026
10.2. Global Extreme Ultraviolet (EUV) Lithography Market Size, Share and Forecast, By End-Users, 2027-2033
10.3. Integrated Device Manufacturers (IDM)
10.4. Foundry
10.5. Memory
11. Global Extreme Ultraviolet (EUV) Lithography Market Forecast, 2020-2033 (USD Million)
11.1. Global Extreme Ultraviolet (EUV) Lithography Market Size and Market Share
12. Global Extreme Ultraviolet (EUV) Lithography Market, By Region, 2020-2033 (USD Million)
12.1. Global Extreme Ultraviolet (EUV) Lithography Market Size and Market Share By Region (2020-2026)
12.2. Global Extreme Ultraviolet (EUV) Lithography Market Size and Market Share By Region (2027-2033)
12.3. Asia-Pacific
12.3.1. Australia
12.3.2. China
12.3.3. India
12.3.4. Japan
12.3.5. South Korea
12.3.6. Rest of Asia-Pacific
12.4. Europe
12.4.1. France
12.4.2. Germany
12.4.3. Italy
12.4.4. Spain
12.4.5. United Kingdom
12.4.6. Rest of Europe
12.5. Middle East and Africa
12.5.1. Kingdom of Saudi Arabia
12.5.2. United Arab Emirates
12.5.3. Qatar
12.5.4. South Africa
12.5.5. Egypt
12.5.6. Morocco
12.5.7. Nigeria
12.5.8. Rest of Middle-East and Africa
12.6. North America
12.6.1. Canada
12.6.2. Mexico
12.6.3. United States
12.7. Latin America
12.7.1. Argentina
12.7.2. Brazil
12.7.3. Rest of Latin America
13. Company Profile
13.1. ASML
13.1.1. Company details
13.1.2. Financial outlook
13.1.3. Product summary
13.1.4. Recent developments
13.2. CANON INC.
13.2.1. Company details
13.2.2. Financial outlook
13.2.3. Product summary
13.2.4. Recent developments
13.3. GLOBAL FOUNDRIES
13.3.1. Company details
13.3.2. Financial outlook
13.3.3. Product summary
13.3.4. Recent developments
13.4. INTEL CORPORATION
13.4.1. Company details
13.4.2. Financial outlook
13.4.3. Product summary
13.4.4. Recent developments
13.5. NIKON CORPORATION
13.5.1. Company details
13.5.2. Financial outlook
13.5.3. Product summary
13.5.4. Recent developments
13.6. NTT ADVANCED TECHNOLOGY CORPORATION
13.6.1. Company details
13.6.2. Financial outlook
13.6.3. Product summary
13.6.4. Recent developments
13.7. NUFLARE TECHNOLOGY INC
13.7.1. Company details
13.7.2. Financial outlook
13.7.3. Product summary
13.7.4. Recent developments
13.8. SAMSUNG
13.8.1. Company details
13.8.2. Financial outlook
13.8.3. Product summary
13.8.4. Recent developments
13.9. TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
13.9.1. Company details
13.9.2. Financial outlook
13.9.3. Product summary
13.9.4. Recent developments
13.10. TOSHIBA INDIA PVT LTD
13.10.1. Company details
13.10.2. Financial outlook
13.10.3. Product summary
13.10.4. Recent developments
13.11. OTHERS
14. Conclusion
15. List of Abbreviations
16. Reference Links
SPER Market Research’s methodology uses great emphasis on primary research to ensure that the market intelligence insights are up to date, reliable and accurate. Primary interviews are done with players involved in each phase of a supply chain to analyze the market forecasting. The secondary research method is used to help you fully understand how the future markets and the spending patterns look likes.
The report is based on in-depth qualitative and quantitative analysis of the Product Market. The quantitative analysis involves the application of various projection and sampling techniques. The qualitative analysis involves primary interviews, surveys, and vendor briefings. The data gathered as a result of these processes are validated through experts opinion. Our research methodology entails an ideal mixture of primary and secondary initiatives.
